A research team around Shigeru SHIMADA has developed a one-pot three-step catalytic system for the synthesis of siloxanes. The three catalytic reactions are hydrosilylation of silyl ester with iridium catalyst, rearrangement reaction by a boron catalyst, and decarbonylation-condensation by a boron catalyst. It is expected that this procedure responds to the needs to develop precisely synthesiszed organosilicons with improved physical properties such as heat resistance, light fastness, crack resistance and adhesiveness. The studies were supported by a NEDO greant.
Angewandte Chemie International Edition DOI: 10.1002/anie.201611623
NAIST team develops one-pot synthesis for organosilicon materials